News Academy of Engineering Sciences A.M. Prokhorov Annotation << Back EQUIPMENT FOR THE HYDROGEN-FREE CHEMICAL VAPOR DEPOSITION OF OXIGEN-FREE REFRACTORY MATERIALS O.Yu. GONCHAROV, R.R. FAIZULLIN, V.N. GUSKOV, L.Ch. BALDAEV The problem of the development of equipment for hydrogenfree low-temperature chemical vapor deposition (CVD) coatings of refractory materials was discussed. Constructive solutions for the evaporation / sublimation and transport of precursors into the reaction zone are off ered. Keywords: chemical vapor deposition, refractory materials, CVD equipment. Contacts: e-mail: olaf@nm.ru Pp. 03-09.